Abstract. The production of a large diameter ECR plasma with microwaves of frequency 2.45 GHz is reviewed, including our experimental results with a multi-slot antenna and a TEol mode microwave converter. It is pointed out that the electromagnetic waves play an important role in plasma uniformity as well as plasma production. Furthermore, it is found that the X wave contributes to plasma uniformity for electron density of (1-2)x10'~m- ~ which almost corresponds to the L cutof 1
The growing number and variety of fundamental, applied, and industrial uses for high intensity, high...
The windowed electron cyclotron resonance (ECR) source, invented by Getty, was modified into a windo...
The brief description to the theory of propagation of electromagnetic waves in plasma was done. The ...
The production of a large diameter ECR plasma with microwaves of frequency 2.45 GHz is reviewed, inc...
A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile ...
This paper is specially focused on large area microwave plasma. It briefly reviews recent results in...
A large diameter plasma over 300 mm in diameter is produced by electron cyclotron resonance (ECR) di...
Despite the steady advance in the technology of the ECR ion source, present art forms have not yet r...
An average increase of about one order of magnitude per decade in the performance of ECR ion sources...
The spatial profile of power deposition to electrons is controlled in order to improve the uniformit...
The goal of this dissertation was to gain an understanding on the relative importance of microwave p...
International audienceThe design and characterization of a multi-dipolar microwave electron cyclotro...
Plasma technology is used in a wide field of applications for example for PECD-deposition, activatio...
Plasmas of electron cyclotron resonance ion sources (ECRISs) are prone to kinetic instabilities due...
A Microwave Discharge Plasma Reactor devoted to the complex molecules dissociation has been designed...
The growing number and variety of fundamental, applied, and industrial uses for high intensity, high...
The windowed electron cyclotron resonance (ECR) source, invented by Getty, was modified into a windo...
The brief description to the theory of propagation of electromagnetic waves in plasma was done. The ...
The production of a large diameter ECR plasma with microwaves of frequency 2.45 GHz is reviewed, inc...
A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile ...
This paper is specially focused on large area microwave plasma. It briefly reviews recent results in...
A large diameter plasma over 300 mm in diameter is produced by electron cyclotron resonance (ECR) di...
Despite the steady advance in the technology of the ECR ion source, present art forms have not yet r...
An average increase of about one order of magnitude per decade in the performance of ECR ion sources...
The spatial profile of power deposition to electrons is controlled in order to improve the uniformit...
The goal of this dissertation was to gain an understanding on the relative importance of microwave p...
International audienceThe design and characterization of a multi-dipolar microwave electron cyclotro...
Plasma technology is used in a wide field of applications for example for PECD-deposition, activatio...
Plasmas of electron cyclotron resonance ion sources (ECRISs) are prone to kinetic instabilities due...
A Microwave Discharge Plasma Reactor devoted to the complex molecules dissociation has been designed...
The growing number and variety of fundamental, applied, and industrial uses for high intensity, high...
The windowed electron cyclotron resonance (ECR) source, invented by Getty, was modified into a windo...
The brief description to the theory of propagation of electromagnetic waves in plasma was done. The ...
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