Materials Modification with Heavy Ions Implantation

Abstract – Ion implantation set-up on the base of ion gun with target sputtering by Penning disgorge plasma was created. The set-up allows conducting implantation of ions of various materials with im-plantation current 20–30 mA/cm 2 at acceleration voltage up to 30 kV. Combined implantation of TiB2 compound and Argon or Nitrogen gases were applied for surface properties modification of WC– Co hard alloy and SKD11 steel. Effect of implanta-tion on mechanical and tribology properties have been studied and discussed with respect to implan-tation doze. Examples of application to real prod-ucts are presented. Perspectives for industrial scale applications are discussed. 1