Experimental and theoretical studies of the behaviour of hydrocarbon species in d.c.-arc jet chemical vapour deposition reactors are reported, as a function of carbon source gas flow rate. CH(X) and C (a) radical number densities have been measured in2 absorption (by cavity ring-down spectroscopy) and via their optical emission in an arc jet plume operating with a standard CH y4 H yAr feedstock gas mixture. The C (a) radical number density is seen to exhibit a linear (or sub-linear) dependence on CH2 2 4 flow rate, in accord with previous findings (J. Appl. Phys. 82 (1997) 2072) for both C (a) and C (X) radicals in a lower power2 3 d.c.-arc jet. The present findings, together with the comprehensive set of earlier experimental data on gas ve...
In this work, the results of optical emission study of C-2 radicals generated in carbon arc plasma a...
have identified CH3 as the dominant diamond growth precursor in our dc arcjet reactor.1 Based on con...
Experiments concerning the growth rate and quality of an amorphous hydrogenated carbon film deposite...
Comparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW ...
Results on studies of molecular spectra emitted in the initial stages of fullerene formation during ...
We studied carbon/hydrogen/oxygen chemical kinetics at time scales and thermal conditions relevant t...
A combination of experiment [optical emission and cavity ring-down spectroscopy (CRDS) of electronic...
A two-dimensional numerical analysis on the thermal decomposition of methane (CH4) by Ar/H2 thermal ...
It is a known fact that a-C:H can be deposited at high rates by injecting acetylene (or other precur...
The effect of changing different parameters involved in the chemical vapor deposition (CVD) process ...
It is a known fact that a-C:H can be deposited at high rates by injecting acetylene (or other precur...
Chemical vapor deposition of carbon from methane was used as a test reaction to investigate the infl...
Tractable chemical models are validated for the CVD of silicon and carbon. Dilute silane (SiH4) and ...
The gas flow in a linear plasma reactor and the plasma chemistry during hydrogenated amorphous carbo...
Numerical simulation of materials synthesis based on detailed models for the chemical kinetics and t...
In this work, the results of optical emission study of C-2 radicals generated in carbon arc plasma a...
have identified CH3 as the dominant diamond growth precursor in our dc arcjet reactor.1 Based on con...
Experiments concerning the growth rate and quality of an amorphous hydrogenated carbon film deposite...
Comparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW ...
Results on studies of molecular spectra emitted in the initial stages of fullerene formation during ...
We studied carbon/hydrogen/oxygen chemical kinetics at time scales and thermal conditions relevant t...
A combination of experiment [optical emission and cavity ring-down spectroscopy (CRDS) of electronic...
A two-dimensional numerical analysis on the thermal decomposition of methane (CH4) by Ar/H2 thermal ...
It is a known fact that a-C:H can be deposited at high rates by injecting acetylene (or other precur...
The effect of changing different parameters involved in the chemical vapor deposition (CVD) process ...
It is a known fact that a-C:H can be deposited at high rates by injecting acetylene (or other precur...
Chemical vapor deposition of carbon from methane was used as a test reaction to investigate the infl...
Tractable chemical models are validated for the CVD of silicon and carbon. Dilute silane (SiH4) and ...
The gas flow in a linear plasma reactor and the plasma chemistry during hydrogenated amorphous carbo...
Numerical simulation of materials synthesis based on detailed models for the chemical kinetics and t...
In this work, the results of optical emission study of C-2 radicals generated in carbon arc plasma a...
have identified CH3 as the dominant diamond growth precursor in our dc arcjet reactor.1 Based on con...
Experiments concerning the growth rate and quality of an amorphous hydrogenated carbon film deposite...