Delay and power minimization are two important objectives in the current circuit designs. Retiming is a very effective way for delay optimization for sequential circuits. In this paper we propose a framework for multi-level global placement with retiming, targeting simultaneous delay and power optimization. We propose GEO-P for power optimization and GEO-PD algorithm for simultaneous delay and power optimization and provide smooth wirelength, power and delay tradeoff. In GEO-PD, we use retiming based timing analysis and visible power analysis to identify timing and power critical nets and assign proper weights to them to guide the multi-level optimization process. We show an effective way to translate the timing and power analysis results f...
Retiming is a widely investigated technique for performance optimization. It performs powerful modif...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
Delay minimization and power minimization are two important objectives in the design of the high-per...
Delay minimization continues to be an important objective in the design of high-performance computin...
Abstract—In this paper, we formulate the physical planning with retiming problem and propose an algo...
Retiming is a widely investigated technique for performance optimization. In general, it performs ex...
Abstract—Retiming is a widely investigated technique for performance optimization. It performs power...
Delay and wirelength minimization continue to be important objectives in the design of high-performa...
We present a new timing driven method for global placement. Our method is based on the observation t...
We present ecient, optimal algorithms for tim-ing optimization by discrete wire sizing and buer in-s...
Retiming is a powerful optimization technique for synchronize sequential circuits that relocates del...
This paper investigates the application of simultaneous retiming and clock scheduling for optimizing...
A new variation-aware energy-delay optimization method is proposed for device-circuit co-design in n...
A new variation-aware energy-delay optimization method is proposed for device-circuit co-design in n...
Retiming is a widely investigated technique for performance optimization. It performs powerful modif...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
Delay minimization and power minimization are two important objectives in the design of the high-per...
Delay minimization continues to be an important objective in the design of high-performance computin...
Abstract—In this paper, we formulate the physical planning with retiming problem and propose an algo...
Retiming is a widely investigated technique for performance optimization. In general, it performs ex...
Abstract—Retiming is a widely investigated technique for performance optimization. It performs power...
Delay and wirelength minimization continue to be important objectives in the design of high-performa...
We present a new timing driven method for global placement. Our method is based on the observation t...
We present ecient, optimal algorithms for tim-ing optimization by discrete wire sizing and buer in-s...
Retiming is a powerful optimization technique for synchronize sequential circuits that relocates del...
This paper investigates the application of simultaneous retiming and clock scheduling for optimizing...
A new variation-aware energy-delay optimization method is proposed for device-circuit co-design in n...
A new variation-aware energy-delay optimization method is proposed for device-circuit co-design in n...
Retiming is a widely investigated technique for performance optimization. It performs powerful modif...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...