Add to ORKGWe describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable tbr extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1 2 nm range and uncalibrated spectra in the 9-15 nm range are obtained using a free-standing transmission grating and a CCD-detector. 1
The authors report on the development of a high power laser plasma Extreme Ultraviolet (EUV) source ...
A high repetition-rate laser plasma target source system wherein ice crystals are irradiated by a la...
International audienceThe present work, performed in the frame of the EXULITE project, was dedicated...
The liquid-xenon-jet laser-plasma source is one of the extreme-ultraviolet (EUV) source technologies...
We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid-dro...
This thesis describes the development, characterization andoptimization of compact, high-brightness,...
Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for ap...
We describe a new liquid-target system for low-debris laser-plasma soft x-ray sources. The system is...
We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity l...
We have configured a new type of target for laser plasma x-ray generation. This target consists of a...
A laser-plasma EUV radiation source that generates larger liquid droplets for the plasma target mate...
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
A high repetition-rate laser plasma target source system and lithography system is disclosed. The ta...
Liquid droplet-target laser plasma sources were presented for extreme ultraviolet lithography. A tar...
The development of a laser-plasma EUV line emission source based on frozen water droplet targets whi...
The authors report on the development of a high power laser plasma Extreme Ultraviolet (EUV) source ...
A high repetition-rate laser plasma target source system wherein ice crystals are irradiated by a la...
International audienceThe present work, performed in the frame of the EXULITE project, was dedicated...
The liquid-xenon-jet laser-plasma source is one of the extreme-ultraviolet (EUV) source technologies...
We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid-dro...
This thesis describes the development, characterization andoptimization of compact, high-brightness,...
Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for ap...
We describe a new liquid-target system for low-debris laser-plasma soft x-ray sources. The system is...
We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity l...
We have configured a new type of target for laser plasma x-ray generation. This target consists of a...
A laser-plasma EUV radiation source that generates larger liquid droplets for the plasma target mate...
Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form...
A high repetition-rate laser plasma target source system and lithography system is disclosed. The ta...
Liquid droplet-target laser plasma sources were presented for extreme ultraviolet lithography. A tar...
The development of a laser-plasma EUV line emission source based on frozen water droplet targets whi...
The authors report on the development of a high power laser plasma Extreme Ultraviolet (EUV) source ...
A high repetition-rate laser plasma target source system wherein ice crystals are irradiated by a la...
International audienceThe present work, performed in the frame of the EXULITE project, was dedicated...