MIM’s the Word – Capac

Capacitor properties were studied using a special test mask. We derived improved measurement and test capacitor and cell design. We saw a small perimeter scaling as well as the usual area scaling. Time dependent dielectric breakdown was extensively studied. We determined that the 4V/sec breakdown voltage is a sound figure of merit for that, and that nitride deposition conditions can be tuned for better TDDB performance, important for medium voltage applications. Capacitor nitrides as thin as 25 nm were seen to be feasible. 1