Abstract—The impact of scaling on the analog performance of MOS devices at RF frequencies was studied. Trends in the RF per-formance of nominal gate length NMOS devices from 350-nm to 50-nm CMOS technologies are presented. Both experimental data and circuit simulations with an advanced validated compact model (MOS Model 11) have been used to evaluate the RF performance. RF performance metrics such as the cutoff frequency, maximum oscillation frequency, power gain, noise figure, linearity, and 1 noise were included in the analysis. The focus of the study was on gate and drain bias conditions relevant for RF circuit design. A scaling methodology for RF-CMOS based on limited linearity degradation is proposed. Index Terms—CMOS integrated circui...
[[abstract]]In this paper, we demonstrate a comprehensive analysis of small-signal source-body resis...
The rapid evolution of silicon MOSFET technology is fueled by a never-ending demand for better perfo...
Recent advances in complementary metal oxide semiconductor (CMOS) processing, continuous scaling of ...
\u3cp\u3eThe impact of scaling on the analog performance of MOS devices at RF frequencies was studie...
Abstract—The radio-frequency (rf) performance of a 0.18- m CMOS logic technology is assessed by eval...
In recent times, CMOS devices have played an increasing important role in the area of RF-ICs to impl...
International audienceWith the cutting edge of technology, the number of portable devices using wire...
With the cutting edge of technology, the number of portable devices using wireless equipment is incr...
This paper presents a model for the frequency response of 65 nm RF power CMOS devices as a function ...
MOSFET radio-frequency characterization and modeling is studied, both with SOI CMOS and bulk CMOS te...
Aggressive gate-length downscaling of the metal-oxide-semiconductor field-effect transistor (MOSFET)...
The scalability of advanced CMOS processes for RF applications is presented from circuit design and ...
As many millimeter-wave (mm-wave) applications has been proposed for the next generation communicati...
The design of radio-frequency (RF) integrated circuits (ICs) in deep-submicron CMOS processes requir...
[[abstract]]The measured RF performance of 0.5, 0.25, and 0.18 μm MOSFETs gradually saturates as sca...
[[abstract]]In this paper, we demonstrate a comprehensive analysis of small-signal source-body resis...
The rapid evolution of silicon MOSFET technology is fueled by a never-ending demand for better perfo...
Recent advances in complementary metal oxide semiconductor (CMOS) processing, continuous scaling of ...
\u3cp\u3eThe impact of scaling on the analog performance of MOS devices at RF frequencies was studie...
Abstract—The radio-frequency (rf) performance of a 0.18- m CMOS logic technology is assessed by eval...
In recent times, CMOS devices have played an increasing important role in the area of RF-ICs to impl...
International audienceWith the cutting edge of technology, the number of portable devices using wire...
With the cutting edge of technology, the number of portable devices using wireless equipment is incr...
This paper presents a model for the frequency response of 65 nm RF power CMOS devices as a function ...
MOSFET radio-frequency characterization and modeling is studied, both with SOI CMOS and bulk CMOS te...
Aggressive gate-length downscaling of the metal-oxide-semiconductor field-effect transistor (MOSFET)...
The scalability of advanced CMOS processes for RF applications is presented from circuit design and ...
As many millimeter-wave (mm-wave) applications has been proposed for the next generation communicati...
The design of radio-frequency (RF) integrated circuits (ICs) in deep-submicron CMOS processes requir...
[[abstract]]The measured RF performance of 0.5, 0.25, and 0.18 μm MOSFETs gradually saturates as sca...
[[abstract]]In this paper, we demonstrate a comprehensive analysis of small-signal source-body resis...
The rapid evolution of silicon MOSFET technology is fueled by a never-ending demand for better perfo...
Recent advances in complementary metal oxide semiconductor (CMOS) processing, continuous scaling of ...