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Review TRENDS in Biotechnology Vol.24 No.7 July 2006yield the structures. Because shorter wavelengths areembossing and printing methods exclusively using an elastomeric mold and/or stamp such as poly(dimethylsi-loxane) (PDMS) [7]. Applications for these techniques, as related to microarrays for genomics, proteomics and tissue engineering, will be discussed. Conventional patterning by photolithography Conventional photolithography (Figure 1a) generates patterns by selectively exposing the photoresist-coated surface (see Glossary) with UV light, followed by etch to Glossary Centipoise (cPs) – a centimeter–gram–second unit of dynamic viscosity, equal to one-hundredth of a poise. Glass transition temperature (Tg) – the mid-point of a temperature range, below which materials gradually become more viscous as they change from liquid to solid. MAPL – a patterning technique, whereby a ligand (or ligands) can be immobilized at a controlled surface density inside a defined area to capture molecules in their environment. Photomask – high-purity quartz or glass plates used in photolithography that contain precision images of integrated circuits or chips, used as masters for the optical transfer of these images. Photoresist – a light-sensitive material used to form a patterned coating on ais noted that soft lithography broadly refers to molding, contact printing are termed transfer printing processes. It than being cooled.Van N. Truskett1 and Michael P.C. Watts