Abstract—Aggressive scaling to nanometer CMOS technologies causes both analog and digital circuit parameters to degrade over time due to die-level stress effects (i.e. NBTI, HCI, TDDB, etc). In addition, failure-time dispersion increases due to increasing process variability. In this paper an innovative methodology to simulate analog circuit reliability is presented. Advantages over current state of the art reliability simulators include, among others, the possibility to estimate the impact of variability and the ability to account for the effects of complex time-varying stress signals. Results show that taking time-varying stress signals into account provides circuit reliability information not visible with classic DC-only reliability simu...
In this paper we present a reliability simulation framework from atomistic simulations up to circuit...
We investigate the NBTI degradation and recovery of pMOSFETs under continuously varying analog-circu...
A reliability simulator for traditional gate oxide time dependent dielectric breakdown (TDDB) and th...
A complete and comprehensive physics-based model for NBTI reliability simulation of analog circuits ...
Paper presented at the 2017 IEEE International Symposium on Circuits and Systems (ISCAS), held in Ba...
This paper discusses an efficient method to analyze the spatial and temporal reliability of analog a...
This book focuses on modeling, simulation and analysis of analog circuit aging. First, all important...
Integrated analog circuit design in nanometer CMOS technologies brings forth new and significant rel...
The reliability variation simulation methodology for advanced integrated circuit (IC) design is pres...
The reliability variation simulation methodology for advanced integrated circuit (IC) design is pres...
Today, micro-electronic circuits are undeniably and ubiquitously present in our society. Transportat...
We experimentally and theoretically investigate the NBTI degradation of pMOS devices due to analog s...
This paper demonstrates an innovative, deterministic, variation-aware reliability modeling and simul...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
In this paper we present a reliability simulation framework from atomistic simulations up to circuit...
We investigate the NBTI degradation and recovery of pMOSFETs under continuously varying analog-circu...
A reliability simulator for traditional gate oxide time dependent dielectric breakdown (TDDB) and th...
A complete and comprehensive physics-based model for NBTI reliability simulation of analog circuits ...
Paper presented at the 2017 IEEE International Symposium on Circuits and Systems (ISCAS), held in Ba...
This paper discusses an efficient method to analyze the spatial and temporal reliability of analog a...
This book focuses on modeling, simulation and analysis of analog circuit aging. First, all important...
Integrated analog circuit design in nanometer CMOS technologies brings forth new and significant rel...
The reliability variation simulation methodology for advanced integrated circuit (IC) design is pres...
The reliability variation simulation methodology for advanced integrated circuit (IC) design is pres...
Today, micro-electronic circuits are undeniably and ubiquitously present in our society. Transportat...
We experimentally and theoretically investigate the NBTI degradation of pMOS devices due to analog s...
This paper demonstrates an innovative, deterministic, variation-aware reliability modeling and simul...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
In this paper we present a reliability simulation framework from atomistic simulations up to circuit...
We investigate the NBTI degradation and recovery of pMOSFETs under continuously varying analog-circu...
A reliability simulator for traditional gate oxide time dependent dielectric breakdown (TDDB) and th...